Author Archive for: webmaster
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Entries by webmaster
July 10th 2018 — A new single ion implantation tool is launched at the UK National Ion Beam Centre. Part of a 3 year project between Ionoptika and the University of Surrey and funded by the EPSRC, the new instrument will enable researchers to create new quantum devices faster than ever before. The instrument, named SIMPLE (Single […]
The AVS Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2018) will be held on the Big Island of Hawaii from December 2 – 6, 2018. This conference is being organized by AVS (United States) with a Steering Committee composed of representatives from Australia, Canada, China, Japan, Korea, Mexico, New Zealand, Philippines, Singapore, Taiwan, and the United States. Symposium attendees will […]
Ionoptika are delighted to announce we are sponsoring the 7th Chinese National Conference on Secondary Ion Mass Spectrometry (SIMS-China VII), which will be held from 9-12th October, 2018, at the Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences in Suzhou, China. The conference aims to bring together researchers and practitioners from academia […]
We are delighted to announce the launch of our new website! The new site brings a fresh new look, a more intuitive layout, and a lot more content. We’re very pleased with it, and we hope you like it too! Why not tell us what you think in the comments section below, or like and […]
Ion beams come in many shapes and sizes; different source technologies produce a wide range of different beam types, some have flexible sources that can accommodate a range of elements, while some are broad beams, and some analytical. It can be a mine field if you don’t know what you’re looking for. In this application […]
Ionoptika will be attending the 66th ASMS Conference on Mass Spectrometry and Allied Topics, held in San Diego, June 3-7 2018. If you’re attending, please drop by our stand in the exhibition hall and say hello! Looking forward to a productive and informative week.
A common problem faced by TOF SIMS analysis is loss of peak resolution and mass accuracy on samples with rough or uneven topography. The J105 SIMS does not suffer from these issues, experiencing no loss in mass accuracy across even the roughest of samples The ability to obtain consistent, accurate results is key to all […]
Depth profiling is a powerful technique in surface analysis for examining interfaces and exploring the 3-dimensional structures of a material, to which SIMS is uniquely suited. Many modern instruments are equipped with a sputter ion beam in addition to their primary analysis beam for depth profiling. This enables users to perform “etch-cycles” in-between analysis cycles, […]
Performing ToF-SIMS analysis on insulating samples can be particularly challenging. Surface charge can impact the accuracy of the results, or in the worst cases prevent any results being obtained. Thanks to its unique ToF design, the J105 SIMS is capable of imaging highly insulating samples without loss of signal or performance. The Problem Insulating samples […]