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Product List

We offer a  range of high performance ion beam systems and accessories serving surface analysts in industry and research establishments.

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Our Product Line

Thumbnail The SED 03 is a channeltron based system for detection of secondary electrons or ions, providing an amplified signal suitable for feeding into an image display system.   System  Secondary electron/ion...
Thumbnail The RSU 2000 is a fully integrated beam scanning control package, designed for use in conjunction with ion or electron beam systems for imaging, micromachining and lithography. It provides scan...
Thumbnail The IOG C60-40 provides a highly focussed C60 cluster ion beam for molecular SIMS analysis. The use of high mass primary ions provides a substantial yield enhancement of intact molecules and large fragments...
Thumbnail The IOG C60-20 is a high performance tool for SIMS analysis of samples with a high degree of chemical complexity. The use of high mass primary ions provides a substantial yield enhancement of intact...
Thumbnail The IOG C60-10 was developed by Ionoptika in co-operation with Ulvac Phi Corporation as a tool for sputter cleaning and depth profiling of samples for XPS and Auger. The use of a C60 (fullerene) ion...
Thumbnail The IOG 30D provides a highly focussed ion beam for contaminant free micromachining or analysis of small areas. It uses a duoplasmatron ion source and two-lens optical column to produce a...
Thumbnail The IOG 25GA is a high performance gallium ion beam system, designed for use in micromachining and imaging SIMS applications. It offers a wide current range with fine probe capability and d.c. or...
Thumbnail The IOG 25AU is a high performance Liquid Metal Ion Gun system designed to provide a range of gold and gold cluster ion beams for SIMS applications. It offers a wide current range with fine probe...
Thumbnail The IGM 300 system is a complete imaging system incorporating Ionoptika’s latest design of scan controller, the RSU 2000. Combined with secondary electron/ion detection and a comprehensive control...
Thumbnail The IFS 25 is a fully integrated UHV micro-machining instrument built to specific requirements for The University of Southampton, Photonics...
Thumbnail The GCIB 40 is a high performance Cluster Ion Source, intended for use as a primary ion source on the J105 SIMS. It is capable of operating at 10, 20, 30 and 40 keV, with Ar1000 to Ar4000 clusters....
Thumbnail The GCIB 20 is a 20 keV argon cluster ion beam system, designed to produce a focussed beam of argon clusters, with a range of selectable cluster sizes from Ar2 to over Ar2000. With Ar1000 clusters a spot...
Thumbnail The GCIB 10S is a 10 keV argon cluster ion beam system, designed for easy installation on a wide range of surface analysis instruments. It provides an economical means of upgrading XPS, SIMS or...
Thumbnail The FLIG 5 is an ion gun system ideal for use on SIMS depth profiling instruments. It has a floating column which transports O2+ ions at relatively high energy prior to deceleration in the final...
Thumbnail The IOE 10 Electron Gun is designed primarily for charge neutralisation during analysis of insulating materials. It provides high beam current density over a wide range of energy, from 10 microamps...