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Gas Cluster Ion Beam Products

Thumbnail The GCIB 40 is a high performance Cluster Ion Source, intended for use as a primary ion source on the J105 SIMS. It is capable of operating at 10, 20, 30 and 40 keV, with Ar1000 to Ar4000 clusters. The column is fitted with a mass filter, adjustable aperture drive and fast pulsing. It is able to achieve a beam diameter of < 3 µm under SIMS analysis conditions. The adjustable aperture is used to provide a range of spot size and beam current conditions. Cluster size is determined by pulsing the...
Thumbnail The GCIB 20 is a 20 keV argon cluster ion beam system, designed to produce a focussed beam of argon clusters, with a range of selectable cluster sizes from Ar2 to over Ar2000. With Ar1000 clusters a spot size below 7 μm is  available.     The massive clusters are less damaging, for some organic materials, than  other cluster beams in ToF-SIMS. Figure 1 shows a comparison with C60, the least damaging of the other beams in common use, in analysis of DPPC. Ions are generated in the ion source by a...
Thumbnail The GCIB 10S is a 10 keV argon cluster ion beam system, designed for easy installation on a wide range of surface analysis instruments. It provides an economical means of upgrading XPS, SIMS or other systems to use cluster beam sputtering for sample cleaning or depth profile analysis.       The System The GCIB 10S system comprises: Ion source, with cluster generation and ionization chambers Ion optical column, including a mass filter Two turbo pumps, two  backing pumps, gauge, pipework and...