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IOG
C60-10 |
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The IOG C60-10 was developed by Ionoptika in co-operation with Ulvac
Phi Corporation as a tool for sputter cleaning and depth profiling of
samples for XPS and Auger.
The use of a C60 (fullerene) ion beam results in rapid etching with
very low damage to the underlying sample.
The IOG C60-10 represents a major advance for surface analysis. |
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The IOG C60-10 is a fully computer controlled system.
It comprises:
C60 ion source and column (including focussing, scan plates, mass
filter, alignment and gate valve)
Control & HV electronics (19inch x 3U box)
Cable set
Software control package IG-SOFT 300
(Windows XP)
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| Performance |
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Beam Energy: 1keV to 10keV
Maximum Current: 40nA (C60+ mass filtered)
Minimum spot size: <1mm
Computer Interface: RS232
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| Application |
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Sputter Cleaning of polymer surfaces
for XPS.
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Depth profiling of polymers for XPS.
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Sputter Cleaning of polymer surfaces
for Auger.
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Depth profiling of polymers for SIMS.
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Depth profiling/imaging of biological
materials.
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Sales Contacts
The IOG C60-10 is marketed by Ulvac-Phi, Inc. (Japan & S.E. Asia)
and by Physical Electronics USA, Inc. (U.S.A., Europe & R.O.W.)
as equipment on new XPS systems and as an upgrade package.
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Please
click to request further information on the IOG C60-10. |
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